Paul Scherrer Institute chose Kenosistec
The Paul Scherrer Institute made a request for a PVD facility with specific Hardware characteristics, capable of performing thousands of substrate depositions at high speed.
The Paul Scherrer Institute (PSI) is known as the largest research institute for engineering and natural sciences in Switzerland. This highly esteemed institution is a cutting-edge research hub that works in several fields:
- In the area of Future Technologies and Nature Sciences, PSI is dedicated to the study of the internal structure of materials and the understanding of natural processes, in order to develop new materials for advanced technical applications.
- In the field of Energy and Climate, it realizes new technologies that help to speed up green transition processes, through the creation of systems that can provide sustainable and safe energy, not contaminating the environment and minimizing impacts.
- Health Innovation is another key area of research at PSI, which focuses on studying the causes of diseases and on developing potential treatment methods.
Being able to rely on a state-of-the-art research infrastructure is therefore crucial for PSI, which must have laboratory facilities that can enable it to conduct complex, reproducible and detailed experiments in the fields of materials, nanotechnology and applied sciences.
The Paul Scherrer Institute made a request for a PVD facility with specific Hardware characteristics, capable of performing thousands of substrate depositions. Deposition speed was identified as one of the key requirements to accelerate operations, especially considering the large number of cycles expected. The facility was designed with a focus on facilitating the achievement of PSI's research goals quickly and efficiently, with the aim of ensuring a solid foundation for further scientific development and meeting experimental production needs.
Kenosistec took up the challenge and produced a PVD system (KS 2000 H In-Line), a very versatile sputtering system capable of achieving up to 30,000 substrate depositions of material. In addition to the outstanding deposition speed, improvements were also made to speed up maintenance processes, with the aim of further optimizing plant productivity.
The machine is capable of generating perfectly uniform thin films, facilitating accurate and flawless multiple deposition at all times. After due testing, the PVD plant was handed over to the research institute.
Through the collaboration between the Paul Scherrer Institute and Kenosistec, research will advance further, contributing to progress, scientific discovery and the creation of cutting-edge solutions in technology, medicine and energy.