R&D Systems
We develop new ideas to bring science to its full potential. How? Understanding and transforming the deposition process in pioneering solutions, matching researchers and institutions needs.
Sputtering systems
Sputtering is a low-temperature, high-energy PVD process in which a target is bombarded with ions an...
Evaporation system
The evaporation is a PVD process with low energy and high speed of deposition in which the solid mat...
Cluster
Each chamber can be designed to meet specific requirements by combining different processes (eg Sput...
Cathodic arc evaporation (CAE)
Cathodic arc deposition is a high energy PVD evaporation process with a high deposition rate, mainly...
RIE (reactive ion etching) system
The reactive ion etching (RIE) system is an ion-assisted reactive method based on a combination of c...
PLD systems
PLD
Pulsed Laser Deposition offers a versatile and effective method for depositing thin films with ...
PVD systems with combined technologies
Different techniques for thin film deposition can be applied in a polyvalent solution in cases where...
Gas Sensor Test System
The gas sensor test is a system designed to reproduce, with accuracy and repeatability, the specific...
PECVD – Plasma Enhanced CVD
PECVD, which stands for Plasma-enhanced chemical vapor deposition, is a plasma-enhanced chemical thi...
HI.P.PO.
Thanks to its deposit speed, HI.P.PO. competes with traditional evaporative metallization. Hi.P.Po. ...
Components for thin film deposition
From magnetron sources and cathode arc evaporation sources to power supplies: thanks to our vast exp...