Cathodic arc evaporation (CAE)
Cathodic arc deposition is a high energy PVD evaporation process with a high deposition rate, mainly used with low heat conduction metals.
To vaporize the material from a cathode, an electric arc is used, allowing the material to condense on a substrate forming a thin film. It is a PVD technology known for more than a century, already widely used in the R&D field and recently also introduced in industries that require a resistant and decorative coating, where greater coverage and adhesion is required, especially in the presence of complex geometries.
Thanks to the cathodic arc deposition it is possible to obtain:
- high and efficient production of metal plasma,
- excellent mechanical properties like higher resistance to scratch of the coating
- wide range, constantly growing, of producible materials.
The chamber is water-cooled and can be equipped with a single or double rotation substrate holder for coating flat or 3D samples.
Each configuration can have the following characteristics:
- supports heated up to 400 ° C.
- insulated substrate holder for biasing and plasma cleaning.
- arc sources: 63 mm or 100 mm in diameter (of our design)
Optional Ion Source Plasma for cleaning non-conductive substrates.
The reactive ion etching (RIE) system is an ion-assisted reactive method based on a combination of chemical and physical etching that allows the removal of isotropic and anisotropic material.
Different techniques for thin film deposition can be applied in a polyvalent solution in cases where two or more processes are required on the same substrate, always maintaining a clean deposition env...
Each chamber can be designed to meet specific requirements by combining different processes (eg Sputtering, Evaporation, e-beam…). These systems are multifunctional, expandable, modular and therefore...
From magnetron sources and cathode arc evaporation sources to power supplies: thanks to our vast experience in the production of vacuum systems, we offer the market the best components designed and ma...
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