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R&D Systems

We develop new ideas to bring science to its full potential. How? Understanding and transforming the deposition process in pioneering solutions, matching researchers and institutions needs.
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Sputtering systems

Sputtering is a low-temperature, high-energy PVD process in which a target is bombarded with ions and vaporized, before being deposited on a substrate in the form of a thin atomic layer.

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Evaporation system

The evaporation is a PVD process with low energy and high speed of deposition in which the solid material is finely heated at the rate of the evaporation state.

In a second moment, the vapor thus obtained reaches the substrate, condensing on it.


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Cathodic arc evaporation (CAE)

Cathodic arc deposition is a high energy PVD evaporation process with a high deposition rate, mainly used with low heat conduction metals.

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RIE (reactive ion etching) system

The reactive ion etching (RIE) system is an ion-assisted reactive method based on a combination of chemical and physical etching that allows the removal of isotropic and anisotropic material.

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PVD systems with combined technologies

Different techniques for thin film deposition can be applied in a polyvalent solution in cases where two or more processes are required on the same substrate, always maintaining a clean deposition environment.

Combined technology PVD systems are easy to use and highly performing. They are the perfect solution for academic and industrial, research and training laboratories.

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Cluster

Each chamber can be designed to meet specific requirements by combining different processes (eg Sputtering, Evaporation, e-beam…). These systems are multifunctional, expandable, modular and therefore very flexible.

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PECVD

PECVD, which stands for Plasma-enhanced chemical vapor deposition, is a plasma-enhanced chemical thin film deposition process.

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ALD systems (Atomic layer deposition) and PLD systems (Pulsed laser deposition)

ALD

Atomic Layer Deposition (ALD) is a technology that allows you to deposit high-density material, ensuring accurate uniformity.


PLD

Pulsed laser deposition (PLD) is a deposition technique specifically designed to operate in a UHV (i.e. Ultra High Vacuum) environment.

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Gas sensor test

The gas sensor test is a system designed to reproduce, with accuracy and repeatability, the specific environmental conditions required to test gas sensors.

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Components for thin film deposition

From magnetron sources and cathode arc evaporation sources to power supplies: thanks to our vast experience in the production of vacuum systems, we offer the market the best components designed and manufactured for thin film deposition.

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