{"id":4258,"date":"2023-12-15T10:28:00","date_gmt":"2023-12-15T09:28:00","guid":{"rendered":"https:\/\/www.kenosistec.com\/sistema-rie\/"},"modified":"2025-09-16T08:46:12","modified_gmt":"2025-09-16T06:46:12","slug":"sistema-rie","status":"publish","type":"post","link":"https:\/\/www.kenosistec.com\/es\/sistema-rie\/","title":{"rendered":"Sistema RIE"},"content":{"rendered":"<p>[et_pb_section fb_built=\u00bb1&#8243; _builder_version=\u00bb4.23.1&#8243; _module_preset=\u00bbdefault\u00bb global_colors_info=\u00bb{}\u00bb][et_pb_row _builder_version=\u00bb4.23.1&#8243; _module_preset=\u00bbdefault\u00bb global_colors_info=\u00bb{}\u00bb][et_pb_column type=\u00bb4_4&#8243; _builder_version=\u00bb4.23.1&#8243; _module_preset=\u00bbdefault\u00bb global_colors_info=\u00bb{}\u00bb][et_pb_post_title meta=\u00bboff\u00bb featured_image=\u00bboff\u00bb admin_label=\u00bbTitolo del Post\u00bb _builder_version=\u00bb4.23.1&#8243; _module_preset=\u00bbdefault\u00bb title_font=\u00bb|700||on|||||\u00bb title_text_align=\u00bbcenter\u00bb title_text_color=\u00bbgcid-6f61f39e-84e7-4208-8fe4-806b280dbda6&#8243; title_font_size=\u00bb40px\u00bb custom_margin=\u00bb||0px||false|false\u00bb title_font_size_tablet=\u00bb30px\u00bb title_font_size_phone=\u00bb25px\u00bb title_font_size_last_edited=\u00bbon|phone\u00bb global_colors_info=\u00bb{%22gcid-6f61f39e-84e7-4208-8fe4-806b280dbda6%22:%91%22title_text_color%22%93}\u00bb][\/et_pb_post_title][et_pb_divider divider_position=\u00bbcenter\u00bb divider_weight=\u00bb2px\u00bb _builder_version=\u00bb4.23.1&#8243; _module_preset=\u00bbdefault\u00bb width=\u00bb30%\u00bb module_alignment=\u00bbcenter\u00bb global_colors_info=\u00bb{}\u00bb][\/et_pb_divider][et_pb_text _builder_version=\u00bb4.27.4&#8243; text_font=\u00bb|300|||||||\u00bb text_line_height=\u00bb1.8em\u00bb header_font=\u00bbPoppins|300|||||||\u00bb header_text_color=\u00bb#555555&#8243; header_font_size=\u00bb16px\u00bb header_line_height=\u00bb1.9em\u00bb text_orientation=\u00bbcenter\u00bb locked=\u00bboff\u00bb global_colors_info=\u00bb{}\u00bb]<\/p>\n<p>El sistema RIE (<em>Reactive Ion Etching<\/em>) es un m\u00e9todo reactivo asistido por iones, basado en una combinaci\u00f3n de ataque qu\u00edmico y f\u00edsico que permite la eliminaci\u00f3n de material de forma isotr\u00f3pica y anisotr\u00f3pica.<\/p>\n<p>El R.I.E emplea principalmente procesos en los que un fuerte bombardeo de iones rompe los enlaces qu\u00edmicos: los radicales reaccionan qu\u00edmicamente con los \u00e1tomos expuestos en la superficie, produciendo un producto vol\u00e1til.<\/p>\n<p>[\/et_pb_text][\/et_pb_column][\/et_pb_row][\/et_pb_section][et_pb_section fb_built=\u00bb1&#8243; _builder_version=\u00bb4.23.1&#8243; _module_preset=\u00bbdefault\u00bb background_image=\u00bbhttps:\/\/www.kenosistec.com\/wp-content\/uploads\/2023\/12\/quadrati.webp\u00bb global_colors_info=\u00bb{}\u00bb][et_pb_row column_structure=\u00bb3_5,2_5&#8243; _builder_version=\u00bb4.23.1&#8243; _module_preset=\u00bbdefault\u00bb global_colors_info=\u00bb{}\u00bb][et_pb_column type=\u00bb3_5&#8243; _builder_version=\u00bb4.23.1&#8243; _module_preset=\u00bbdefault\u00bb global_colors_info=\u00bb{}\u00bb][et_pb_gallery gallery_ids=\u00bb3819&#8243; fullwidth=\u00bbon\u00bb _builder_version=\u00bb4.23.1&#8243; _module_preset=\u00bbdefault\u00bb auto=\u00bbon\u00bb auto_speed=\u00bb4000&#8243; global_colors_info=\u00bb{}\u00bb][\/et_pb_gallery][\/et_pb_column][et_pb_column type=\u00bb2_5&#8243; _builder_version=\u00bb4.23.1&#8243; _module_preset=\u00bbdefault\u00bb global_colors_info=\u00bb{}\u00bb][et_pb_text _builder_version=\u00bb4.27.4&#8243; text_font=\u00bb|300|||||||\u00bb header_font=\u00bbPoppins|300|||||||\u00bb header_text_color=\u00bb#555555&#8243; 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_dynamic_attributes=\u00bbbutton_url\u00bb _module_preset=\u00bbdefault\u00bb custom_button=\u00bbon\u00bb button_text_size=\u00bb15px\u00bb button_text_color=\u00bb#ffffff\u00bb button_bg_color=\u00bbgcid-6f61f39e-84e7-4208-8fe4-806b280dbda6&#8243; button_border_width=\u00bb7px\u00bb button_border_color=\u00bbgcid-6f61f39e-84e7-4208-8fe4-806b280dbda6&#8243; button_border_radius=\u00bb5px\u00bb button_letter_spacing=\u00bb1px\u00bb button_font=\u00bb||||||||\u00bb button_icon=\u00bb&#xe087;||divi||400&#8243; button_on_hover=\u00bboff\u00bb custom_margin=\u00bb||20px||false|false\u00bb custom_padding=\u00bb0px|30px|0px|30px|true|true\u00bb global_colors_info=\u00bb{%22gcid-6f61f39e-84e7-4208-8fe4-806b280dbda6%22:%91%22button_text_color__hover%22,%22button_bg_color%22,%22button_border_color%22,%22button_text_color__hover%22,%22button_bg_color%22,%22button_border_color%22%93,%22gcid-da4bfde5-4ebc-4e81-9e95-959b3780db55%22:%91%22button_bg_color__hover%22,%22button_border_color__hover%22,%22button_bg_color__hover%22,%22button_border_color__hover%22%93}\u00bb button_text_color__hover=\u00bb#153359&#8243; 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_module_preset=\u00bbdefault\u00bb tab_text_color=\u00bbgcid-6f61f39e-84e7-4208-8fe4-806b280dbda6&#8243; tab_font=\u00bb|||on|||||\u00bb tab_font_size=\u00bb16px\u00bb background_enable_color=\u00bboff\u00bb border_width_all=\u00bb0px\u00bb global_colors_info=\u00bb{%22gcid-6f61f39e-84e7-4208-8fe4-806b280dbda6%22:%91%22active_tab_background_color%22,%22tab_text_color%22%93}\u00bb][et_pb_tab title=\u00bbCaracter\u00edsticas\u00bb _builder_version=\u00bb4.27.4&#8243; _module_preset=\u00bbdefault\u00bb body_font=\u00bb|300|||||||\u00bb body_font_size=\u00bb16px\u00bb background_enable_color=\u00bboff\u00bb global_colors_info=\u00bb{}\u00bb]<\/p>\n<p>Este sistema en particular est\u00e1 dise\u00f1ado para el grabado en seco y de alta resoluci\u00f3n.<\/p>\n<p>Garantiza un procesamiento con un alt\u00edsimo grado de uniformidad.<\/p>\n<p>[\/et_pb_tab][et_pb_tab title=\u00bbConfiguraciones\u00bb _builder_version=\u00bb4.27.4&#8243; _module_preset=\u00bbdefault\u00bb body_font=\u00bb|300|||||||\u00bb body_font_size=\u00bb16px\u00bb global_colors_info=\u00bb{}\u00bb]<\/p>\n<ul>\n<li>Adecuado para trabajar con gases inertes y reactivos para el ataque de SiO\u2082, Al\u2082O\u2083, Au, Cr\u2082O\u2083, Al, MoSi\u2082, TaSi\u2082, gases.<\/li>\n<li>Permite peque\u00f1as unidades productivas con una capacidad de <strong>10-40 obleas por hora<\/strong>.<\/li>\n<li>Indicado para formas irregulares. Portamuestras conectado a la fuente de alimentaci\u00f3n RF.<\/li>\n<li>Flujo de gas uniforme en la superficie con una buena contenci\u00f3n del plasma gracias al cilindro de <strong>pyrex<\/strong>.<\/li>\n<\/ul>\n<p>[\/et_pb_tab][et_pb_tab title=\u00bbPersonalizaciones\u00bb _builder_version=\u00bb4.27.4&#8243; _module_preset=\u00bbdefault\u00bb body_font=\u00bb|300|||||||\u00bb body_font_size=\u00bb16px\u00bb global_colors_info=\u00bb{}\u00bb]<\/p>\n<ul>\n<li>El portamuestras puede dise\u00f1arse para grabar muestras de diferentes dimensiones (desde 2\u2033 hasta 8\u2033 de di\u00e1metro).<\/li>\n<li><strong>Temperatura:<\/strong> puede calentarse hasta un m\u00e1ximo de 300 \u00b0C y enfriarse hasta un m\u00ednimo de -20 \u00b0C.<\/li>\n<\/ul>\n<p>[\/et_pb_tab][\/et_pb_tabs][\/et_pb_column][\/et_pb_row][\/et_pb_section][et_pb_section fb_built=\u00bb1&#8243; _builder_version=\u00bb4.23.1&#8243; _module_preset=\u00bbdefault\u00bb 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.sp-pcp-col-xs-5 { flex: 1 1 calc( 20% - 20px);}.sp-pcp-row .sp-pcp-col-xs-6 {flex: 1 1 calc( 16.66666666666667% - 20px);}.sp-pcp-row .sp-pcp-col-xs-7 {flex: 1 1 calc( 14.28571428% - 20px);}.sp-pcp-row .sp-pcp-col-xs-8 {flex: 1 1 calc( 12.5% - 20px);}}<\/style><!-- Markup Starts -->\n<div id=\"pcp_wrapper-4475\" class=\"sp-pcp-section sp-pcp-container pcp-wrapper-4475 pcp-carousel-wrapper standard sp-carousel_layout\" data-sid=\"4475\">\n\t<div id=\"sp-pcp-id-4475\" class=\"swiper-container sp-pcp-carousel top_right\" dir=\"ltr\" data-carousel='{ \"speed\":600, \"items\":3, \"spaceBetween\":20, \"dynamicBullets\": false, \"navigation\":true, \"pagination\": false, \"autoplay\": true, \"autoplay_speed\": 2000, \"loop\": true, \"autoHeight\": false, \"lazy\":  true, \"simulateTouch\": true, \"freeMode\": false, \"slider_mouse_wheel\": false,\"allowTouchMove\": true, \"slidesPerView\": {\"lg_desktop\": 3, \"desktop\": 3, \"tablet\": 2, \"mobile_landscape\": 1, \"mobile\": 1}, \"navigation_mobile\": true, \"pagination_mobile\": false, \"stop_onHover\": true, \"enabled\": true, \"prevSlideMessage\": \"Previous slide\", \"nextSlideMessage\": \"Next slide\", \"firstSlideMessage\": \"This is the first slide\", \"lastSlideMessage\": \"This is the last slide\", \"keyboard\": \"true\", \"paginationBulletMessage\": \"Go to slide {{index}}\" }'>\n\t\t\t<div class=\"swiper-wrapper\">\n\t\t\t\t\t\t<div class=\" swiper-slide swiper-lazy\">\n\t\t\t<div class=\"sp-pcp-post default pcp-item-6362\" data-id=\"6362\">\n\t\t\t\t\t\t\t\t<div class=\"pcp-post-thumb-wrapper\">\n\t\t\t\t\t<div class=\"sp-pcp-post-thumb-area\">\n\t\t\t\t\t\t\t\t\t\t\t\t<a class=\"sp-pcp-thumb\" href=\"https:\/\/www.kenosistec.com\/es\/sputtering\/\" target=\"_self\" >\n\t\t\t\t\t\t\t\t\t\t\t\t\t<img loading=\"lazy\" decoding=\"async\" src=\"https:\/\/www.kenosistec.com\/wp-content\/uploads\/2023\/12\/Sputtering-1-scaled.webp\" width=\"2048\" height=\"1365\" alt=\"Sputtering R&amp;D\">\n\t\t\t\t\t\t<\/a>\n\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t\t\t\t<div class=\"sp-pcp-post-details\">\n\t\t\t\t\t<div class=\"sp-pcp-post-details-content\">\n\t\t\t\t\t\t\t\t<h2 class=\"sp-pcp-title\">\n\t\t\t\t\t\t\t\t\t<a href=\"https:\/\/www.kenosistec.com\/es\/sputtering\/\"  target=\"_self\">Sputtering<\/a>\t\t\t\t\t\t\t<\/h2>\n\t\t\t\t\t\t<div class=\"sp-pcp-post-content\">\n\t\t\t<p>El sputtering es un proceso PVD de baja temperatura y alta energ\u00eda en el que un blanco (target) es bombardeado con iones de un gas (normalmente arg\u00f3n). Este bombardeo provoca la eyecci\u00f3n de \u00e1tomos o mol\u00e9culas del blanco, que se depositan en forma de pel\u00edcula fina sobre el sustrato.<br \/>\nEs un m\u00e9todo muy controlado y reproducible que permite obtener recubrimientos uniformes y adherentes, incluso en materiales sensibles al calor.<\/p>\n\t\t<div class=\"sp-pcp-readmore\">\n\t\t\t\t\t\t\t<a class=\"pcp-readmore-link\" target=\"_self\" href=\"https:\/\/www.kenosistec.com\/es\/sputtering\/\" >\n\t\t\t\t\t\tM\u00e1s informaci\u00f3n <\/a>\n\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t<\/div>\n\t\t<\/div>\n\t\t\t\t<div class=\" swiper-slide swiper-lazy\">\n\t\t\t<div class=\"sp-pcp-post default pcp-item-4245\" data-id=\"4245\">\n\t\t\t\t\t\t\t\t<div class=\"pcp-post-thumb-wrapper\">\n\t\t\t\t\t<div class=\"sp-pcp-post-thumb-area\">\n\t\t\t\t\t\t\t\t\t\t\t\t<a class=\"sp-pcp-thumb\" href=\"https:\/\/www.kenosistec.com\/es\/sistemas-de-pulverizacion\/\" target=\"_self\" >\n\t\t\t\t\t\t\t\t\t\t\t\t\t<img loading=\"lazy\" decoding=\"async\" src=\"https:\/\/www.kenosistec.com\/wp-content\/uploads\/2023\/12\/e-beam-and-thermal-evaporation-systems-kenosistec.webp\" width=\"734\" height=\"466\" alt=\"e-beam-and-thermal-evaporation-systems-kenosistec\">\n\t\t\t\t\t\t<\/a>\n\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t\t\t\t<div class=\"sp-pcp-post-details\">\n\t\t\t\t\t<div class=\"sp-pcp-post-details-content\">\n\t\t\t\t\t\t\t\t<h2 class=\"sp-pcp-title\">\n\t\t\t\t\t\t\t\t\t<a href=\"https:\/\/www.kenosistec.com\/es\/sistemas-de-pulverizacion\/\"  target=\"_self\">Sistemas de pulverizacion<\/a>\t\t\t\t\t\t\t<\/h2>\n\t\t\t\t\t\t<div class=\"sp-pcp-post-content\">\n\t\t\t<p>La evaporaci\u00f3n es un proceso PVD caracterizado por su baja energ\u00eda y alta velocidad de deposici\u00f3n. En este caso, el material s\u00f3lido se calienta hasta alcanzar su punto de fusi\u00f3n o evaporaci\u00f3n, pasando al estado gaseoso y condens\u00e1ndose sobre la superficie del sustrato.<br \/>\nSe utiliza ampliamente cuando se requieren recubrimientos met\u00e1licos decorativos o funcionales de gran homogeneidad.<\/p>\n\t\t<div class=\"sp-pcp-readmore\">\n\t\t\t\t\t\t\t<a class=\"pcp-readmore-link\" target=\"_self\" href=\"https:\/\/www.kenosistec.com\/es\/sistemas-de-pulverizacion\/\" >\n\t\t\t\t\t\tM\u00e1s informaci\u00f3n <\/a>\n\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t<\/div>\n\t\t<\/div>\n\t\t\t\t<div class=\" swiper-slide swiper-lazy\">\n\t\t\t<div class=\"sp-pcp-post default pcp-item-4301\" data-id=\"4301\">\n\t\t\t\t\t\t\t\t<div class=\"pcp-post-thumb-wrapper\">\n\t\t\t\t\t<div class=\"sp-pcp-post-thumb-area\">\n\t\t\t\t\t\t\t\t\t\t\t\t<a class=\"sp-pcp-thumb\" href=\"https:\/\/www.kenosistec.com\/es\/magnetron-hippo\/\" target=\"_self\" >\n\t\t\t\t\t\t\t\t\t\t\t\t\t<img loading=\"lazy\" decoding=\"async\" src=\"https:\/\/www.kenosistec.com\/wp-content\/uploads\/2023\/12\/kenosistec-high-productive-powered-sputtering-cathode.webp\" width=\"734\" height=\"466\" alt=\"kenosistec-high-productive-powered-sputtering-cathode\">\n\t\t\t\t\t\t<\/a>\n\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t\t\t\t<div class=\"sp-pcp-post-details\">\n\t\t\t\t\t<div class=\"sp-pcp-post-details-content\">\n\t\t\t\t\t\t\t\t<h2 class=\"sp-pcp-title\">\n\t\t\t\t\t\t\t\t\t<a href=\"https:\/\/www.kenosistec.com\/es\/magnetron-hippo\/\"  target=\"_self\">HI.P.PO.<\/a>\t\t\t\t\t\t\t<\/h2>\n\t\t\t\t\t\t<div class=\"sp-pcp-post-content\">\n\t\t\t<p>La nueva generaci\u00f3n de c\u00e1todos de pulverizaci\u00f3n cat\u00f3dica que no ceden calor a los sustratos durante la deposici\u00f3n. Desarrollado y patentado por Kenosistec.<\/p>\n\t\t<div class=\"sp-pcp-readmore\">\n\t\t\t\t\t\t\t<a class=\"pcp-readmore-link\" target=\"_self\" href=\"https:\/\/www.kenosistec.com\/es\/magnetron-hippo\/\" >\n\t\t\t\t\t\tM\u00e1s informaci\u00f3n <\/a>\n\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t<\/div>\n\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t\t\t\t\t\t\t\t\t<div class=\"pcp-button-next swiper-button-next top_right\"><i class=\"fa fa-angle-right\"><\/i><\/div>\n\t\t\t\t<div class=\"pcp-button-prev swiper-button-prev top_right\"><i class=\"fa fa-angle-left\"><\/i><\/div>\t<\/div>\n<\/div>\n[\/et_pb_text][\/et_pb_column][\/et_pb_row][\/et_pb_section]<\/p>\n","protected":false},"excerpt":{"rendered":"<p>El grabado por iones reactivos (Reactive Ion Etching, RIE) es un m\u00e9todo asistido por plasma que combina el bombardeo f\u00edsico de iones con reacciones qu\u00edmicas de especies activas generadas en el plasma.<br \/>\nSe utiliza principalmente para el micrograbado y la microfabricaci\u00f3n, permitiendo definir estructuras precisas en pel\u00edculas delgadas o semiconductores.<\/p>\n","protected":false},"author":1,"featured_media":3819,"comment_status":"open","ping_status":"closed","sticky":false,"template":"","format":"standard","meta":{"_et_pb_use_builder":"on","_et_pb_old_content":"","_et_gb_content_width":"","content-type":"","footnotes":""},"categories":[36],"tags":[],"class_list":["post-4258","post","type-post","status-publish","format-standard","has-post-thumbnail","hentry","category-sistemi-pvd-per-rd"],"yoast_head":"<!-- This site is optimized with the Yoast SEO plugin v28.6 - 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