Components for thin film deposition
Documents
- Sources of Magnetron
- Circular Magnetron
- Rectangular Magnetron
- Cathode arc evaporation source
- Components of the vacuum
- Ability to work in dc, pulsed dc, rf and HiPims modes
- Targets, direct or indirect water cooling
- Cross contamination shield, dark space shield and screw clamp for easy target change
- Thickness of target from 1 to 6.35 mm (with appropriate clamp)
- Series of magnets for conductive and insulating materials or ferromagnetic materials (preconfigured)
- HV or UHV range (preconfigured)
- Internal or external mounting (pre-configured)
- Operating pressure from 2 x 10-3 mbar to 2 x 1 0-2 mbar
- Standard target circular magnetron 2 “, 3” or 4 “(larger on request)
- Tilt o – 25 ° and gas ring (optional)
- Diode version available
- Rectangular Magnetron standard target sizes 8 “x 3”, 12 “x 3”, 16 “x 5”, 22 “x 5”, 43 “x 5”
- It is possible to have other dimensions on request.
- Cathode diameter: 63 or 100 mm
- Up to 250 a
- Arc ignition trigger (Kenosistec exclusive design)
- Fast protection in case of trigger short circuit
- Special dark space shield for moisture reduction
- Easy mounting of the target
- Production of economic targets
- Effective erosion of targets
By mounting these sources aligned, it is possible to deposit the desired thin film even over a large area.
In this configuration each source can be set independently to achieve coating uniformity.
- Manipulators (manual and motorized movements)
- Heaters
- Vacuum transfer vessels
- Feedthrough
- Special flanges
- Windows
- Cryo-traps
- High purity gas distribution system
Related products
Sputtering systems
Sputtering is a low-temperature, high-energy PVD process in which a target is bombarded with ions and vaporized, before being deposited on a substrate in the form of a thin atomic layer.
Evaporation system
The evaporation is a PVD process with low energy and high speed of deposition in which the solid material is finely heated at the rate of the evaporation state.
In a second moment, the vapor thus obtained reaches the substrate, condensing on it.
Cluster
Each chamber can be designed to meet specific requirements by combining different processes (eg Sputtering, Evaporation, e-beam…). These systems are multifunctional, expandable, modular and therefore very flexible.
Cathodic arc evaporation (CAE)
Cathodic arc deposition is a high energy PVD evaporation process with a high deposition rate, mainly used with low heat conduction metals.
RIE (reactive ion etching) system
The reactive ion etching (RIE) system is an ion-assisted reactive method based on a combination of chemical and physical etching that allows the removal of isotropic and anisotropic material.
PLD systems
PLD
Pulsed Laser Deposition offers a versatile and effective method for depositing thin films with precise control over composition, structure, and properties, making it a valuable technique in materials research and device fabrication.
PVD systems with combined technologies
Different techniques for thin film deposition can be applied in a polyvalent solution in cases where two or more processes are required on the same substrate, always maintaining a clean deposition environment.
Combined technology PVD systems are easy to use and highly performing. They are the perfect solution for academic and industrial, research and training laboratories.
Gas Sensor Test System
The gas sensor test is a system designed to reproduce, with accuracy and repeatability, the specific environmental conditions required to test gas sensors.
PECVD – Plasma Enhanced CVD
PECVD, which stands for Plasma-enhanced chemical vapor deposition, is a plasma-enhanced chemical thin film deposition process.
HI.P.PO.
Thanks to its deposit speed, HI.P.PO. competes with traditional evaporative metallization. Hi.P.Po. it is a magnetron sputtering, therefore more reproducible (repeating the same final characteristics regardless of the production batch), stable (uniformity during deposition) and calibratable (changing parameters), even on plastic (abs, polycarbonate, pmma).
Components for thin film deposition
From magnetron sources and cathode arc evaporation sources to power supplies: thanks to our vast experience in the production of vacuum systems, we offer the market the best components designed and manufactured for thin film deposition.