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Thin film deposition for PVD and PECVD coatings

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The KSA 700-1300 V SERIES, PVD systems for large production volumes

The KSA series consists of highly versatile PVD systems, designed for large production volumes and decorative applications.

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Hi.P.Po.

The new generation of Sputtering cathodes that do not transfer heat to substrates during deposition. Developed and patented by Kenosistec, HI.P.PO. it allows to increase productivity by 10 times, thanks to a higher deposition rate, energy savings and to reduce the consumption of target material. Custom sizes available according to specific needs.

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Sputtering Systems

Sputtering is a low-temperature, high-energy PVD process in which a target is bombarded with ions and vaporized, before being deposited on a substrate in the form of a thin atomic layer.

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Evaporation System

The evaporation is a PVD process with low energy and high speed of deposition in which the solid material is finely heated at the rate of the evaporation state.

In a second moment, the vapor thus obtained reaches the substrate, condensing on it.


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Cathodic Arc Evaporation (CAE)

Cathodic arc deposition is a high energy PVD evaporation process with a high deposition rate, mainly used with low heat conduction metals.

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RIE (reactive ion etching) system

The reactive ion etching (RIE) system is an ion-assisted reactive method based on a combination of chemical and physical etching that allows the removal of isotropic and anisotropic material.

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PECVD

PECVD, which stands for Plasma-enhanced chemical vapor deposition, is a plasma-enhanced chemical thin film deposition process.

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ALD systems (Atomic layer deposition) and PLD systems (Pulsed laser deposition)

ALD

Atomic Layer Deposition (ALD) is a technology that allows you to deposit high-density material, ensuring accurate uniformity.


PLD

Pulsed laser deposition (PLD) is a deposition technique specifically designed to operate in a UHV (i.e. Ultra High Vacuum) environment.

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PVD systems with combined technologies

Different techniques for thin film deposition can be applied in a polyvalent solution in cases where two or more processes are required on the same substrate, always maintaining a clean deposition environment.

Combined technology PVD systems are easy to use and highly performing. They are the perfect solution for academic and industrial, research and training laboratories.

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Cluster

Each chamber can be designed to meet specific requirements by combining different processes (eg Sputtering, Evaporation, e-beam…). These systems are multifunctional, expandable, modular and therefore very flexible.

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Gas Sensor Test

The gas sensor test is a system designed to reproduce, with accuracy and repeatability, the specific environmental conditions required to test gas sensors.

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Components for thin film deposition

From magnetron sources and cathode arc evaporation sources to power supplies: thanks to our vast experience in the production of vacuum systems, we offer the market the best components designed and manufactured for thin film deposition.

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